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Tunnel magnetoresistance in epitaxial magnetic tunnel junctions using full-Heusler alloy Co2MnGe thin film and MgO tunnel barrier
Marukame, Takao
Ishikawa, Takayuki
Matsuda, Ken-ichi
Uemura, Tetsuya
Yamamoto, Masafumi
Location: http://hdl.handle.net/2115/13458
Journal of applied physics. 99(8), 2006, 08A904-1-08A904-3
http://dx.doi.org/10.1063/1.2167063

We fabricated fully epitaxial magnetic tunnel junctions (MTJs) using a Co-based full-Heusler alloy Co2MnGe (CMG) thin film as a lower electrode, an MgO tunnel barrier, and a Co50Fe50 upper electrode and investigated their tunnel magnetoresistance (TMR) characteristics. The microfabricated MTJs showed strongly temperature-dependent TMR characteristics with typical TMR ratios of 70% at 7 K and 14% at room temperature (RT). Furthermore, the TMR characteristics exhibited the following notable features in the bias voltage (V) dependence: (1) a cusplike V dependence within a range of similar to +/- 200 mV around V=0 at 7 K, which was smeared out at RT, and (2) a V dependence with pronounced asymmetry regarding the polarity, showing negative TMR ratios in a certain negative bias voltage range around -400 mV at both 7 K and RT (V was defined with respect to the lower CMG electrode). A possible transport mechanism leading to the notably asymmetric V dependence along with the negative TMR for a certain bias voltage region is direct tunneling that reflects the spin-dependent density of states of the CMG electrode.

Belongs to: Hokkaido University Collection of Scholarly and Academic Papers

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Tunnel magnetoresistance in epitaxial magnetic tunnel junctions using full-Heusler alloy Co2MnGe thin film and MgO tunnel barrier
Id. 5797412
Idioma inglés
Titulo Tunnel magnetoresistance in epitaxial magnetic tunnel junctions using full-Heusler alloy Co2MnGe thin film and MgO tunnel barrier
Autor(es) Marukame, Takao
Ishikawa, Takayuki
Matsuda, Ken-ichi
Uemura, Tetsuya
Yamamoto, Masafumi
Location http://hdl.handle.net/2115/13458
Journal of applied physics. 99(8), 2006, 08A904-1-08A904-3
http://dx.doi.org/10.1063/1.2167063
Versión 1.0
Estado Final
Descripción We fabricated fully epitaxial magnetic tunnel junctions (MTJs) using a Co-based full-Heusler alloy Co2MnGe (CMG) thin film as a lower electrode, an MgO tunnel barrier, and a Co50Fe50 upper electrode and investigated their tunnel magnetoresistance (TMR) characteristics. The microfabricated MTJs showed strongly temperature-dependent TMR characteristics with typical TMR ratios of 70% at 7 K and 14% at room temperature (RT). Furthermore, the TMR characteristics exhibited the following notable features in the bias voltage (V) dependence: (1) a cusplike V dependence within a range of similar to +/- 200 mV around V=0 at 7 K, which was smeared out at RT, and (2) a V dependence with pronounced asymmetry regarding the polarity, showing negative TMR ratios in a certain negative bias voltage range around -400 mV at both 7 K and RT (V was defined with respect to the lower CMG electrode). A possible transport mechanism leading to the notably asymmetric V dependence along with the negative TMR for a certain bias voltage region is direct tunneling that reflects the spin-dependent density of states of the CMG electrode.
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(C) 2006 American Institute of Physics.
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Relación [References] http://jap.aip.org/jap/top.jsp
Fecha de contribución 25-oct-2007
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