Resource data
Structural and magnetic properties of epitaxially grown full-Heusler alloy Co2MnGe thin films deposited using magnetron sputtering
Ishikawa, Takayuki Marukame, Takao Matsuda, Ken-ichi Uemura, Tetsuya Arita, Masashi Yamamoto, Masafumi
Location:
http://hdl.handle.net/2115/13461
Journal of applied physics. 99(8), 2006, 08J110-1-08J110-3
http://dx.doi.org/10.1063/1.1270980
Full-Heusler alloy Co2MnGe thin films were epitaxially grown on MgO (001) substrates using magnetron sputtering. The films were deposited at room temperature and subsequently annealed in situ at temperatures ranging from 400 to 600 degrees C. X-ray pole figure measurements for the annealed films showed (111) peaks with fourfold symmetry, which gives direct evidence that these films are epitaxial and crystallized in the L2(1) structure. Furthermore, cross-sectional transmission electron microscope images of a fabricated film indicated that it is single crystalline. The annealed films had sufficiently flat surface morphologies with roughnesses of about 0.26 nm rms at film thicknesses of 45 nm. The saturation magnetization of the annealed films was 4.49 mu(B)/f.u. at 10 K, corresponding to about 90% of the Slater-Pauling value for Co2MnGe.
Belongs to: Hokkaido University Collection of Scholarly and Academic Papers
Descargar SCORM
¡Sea el primero en solicitar este recurso!
Para poder solicitar este recurso debe identificarse como usuario de la biblioteca
Users rating
No hay ninguna valoración para este recurso. Sea el primero en
valorar este recurso.
Detalles del recurso
|
Structural and magnetic properties of epitaxially grown full-Heusler alloy Co2MnGe thin films deposited using magnetron sputtering
|
| Id. |
5797415 |
| Idioma |
inglés
|
| Titulo |
Structural and magnetic properties of epitaxially grown full-Heusler alloy Co2MnGe thin films deposited using magnetron sputtering |
| Autor(es) |
Ishikawa, Takayuki Marukame, Takao Matsuda, Ken-ichi Uemura, Tetsuya Arita, Masashi Yamamoto, Masafumi |
| Location |
http://hdl.handle.net/2115/13461
Journal of applied physics. 99(8), 2006, 08J110-1-08J110-3
http://dx.doi.org/10.1063/1.1270980
|
| Versión |
1.0 |
| Estado |
Final
|
| Descripción |
Full-Heusler alloy Co2MnGe thin films were epitaxially grown on MgO (001) substrates using magnetron sputtering. The films were deposited at room temperature and subsequently annealed in situ at temperatures ranging from 400 to 600 degrees C. X-ray pole figure measurements for the annealed films showed (111) peaks with fourfold symmetry, which gives direct evidence that these films are epitaxial and crystallized in the L2(1) structure. Furthermore, cross-sectional transmission electron microscope images of a fabricated film indicated that it is single crystalline. The annealed films had sufficiently flat surface morphologies with roughnesses of about 0.26 nm rms at film thicknesses of 45 nm. The saturation magnetization of the annealed films was 4.49 mu(B)/f.u. at 10 K, corresponding to about 90% of the Slater-Pauling value for Co2MnGe. |
| Tipo |
199555 bytes application/pdf |
| Palabras clave |
549 |
| Tipo de recurso |
article
|
| Tipo de Interactividad |
Expositivo
|
| Nivel de Interactividad |
muy bajo
|
| Audiencia |
Estudiante
Profesor
Autor
|
| Estructura |
Atomic |
| Coste |
no
|
| Copyright |
sí
|
|
(C) 2006 American Institute of Physics. |
| Formatos |
199555 bytes application/pdf |
| Requerimientos técnicos |
Browser: Any |
| Relación |
[References] http://jap.aip.org/jap/top.jsp
|
| Fecha de contribución |
25-oct-2007 |
| Contacto |
|
|
|
|